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  • High temperature and high pressure optical floating zone furnace

High temperature and high pressure optical floating zone furnace

  • Product Item : 665902
  • Category: Materials Science Instruments
  • High temperature and high pressure optical floating zone furnace
  • Laboratory instruments
  • biological instruments
  • electronic laboratory instruments,
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High temperature and high pressure optical floating zone furnace

The high-temperature and high-pressure optical floating zone single crystal furnace launched by the company can provide growth temperatures above 2200-3000 ℃, and the high pressure in the crystal growth chamber can reach 300 bar, with a high vacuum of even 10-5 bar. Suitable for growing various superconducting material single crystals, dielectric and magnetic material single crystals, oxide and intermetallic compound single crystals, etc.
Application field
Suitable for growing various superconducting material single crystals, dielectric and magnetic material single crystals, oxide and intermetallic compound single crystals, etc.
High temperature resistance, high pressure resistance, high vacuum resistance
Sample chamber with high transmittance and easy disassembly and assembly
Applied Light by Fraunhofer, Germany
High reflectivity mirrors optimized by the Precision Engineering Research Institute,
The position of the mirror body can be controlled and adjusted by a high-precision stepper motor
Aperture type light intensity controller
More convenient adjustment of melting zone temperature to extend bulb life
Simulated touch screen control software
Friendly interface and simple operation
Temperature measurement technology for melting zone temperature selection
Real time monitoring of heating zone temperature

Multiple independent air path control options

Can control the flow and pressure of N2, O2, Ar, air, etc

And can mix gases proportionally and react with the melt zone
Gas impurity removal options
Can increase the oxygen content in high-pressure argon gas to 10-12ppm
Annealing options
Can provide for single crystal rods leaving the melt zone
High annealing temperature of 1100 ℃ and high-pressure oxygen environment
Characteristics of ScIDre single crystal furnace
Adopting a vertical optical path design
Adopting high illumination short arc xenon lamp with multiple power specifications to choose from
Melt zone temperature:>3000 ℃
Pressure in the melting zone: Various specifications such as 10bar/50bar/100bar/150bar/300bar are available for selection
Multiple gas paths such as oxygen/argon/nitrogen/air/mixed gas are available for selection
Using grating control technology, the heating power can be continuously adjusted from 0 to 100%
The sample chamber can achieve a low vacuum environment of 10-5mbar
Abundant Upgradable Options
Technical parameters of ScIDre single crystal furnace
Melting zone temperature: above 2000-3000 ℃
Melt zone pressure: optional at 10, 50, 100, 150, and 300 bars
Melting zone vacuum: 1 * 10-2 mbar or 1 * 10-5 mbar optional
Melting zone atmosphere: Ar, O2, N2, etc. are optional
Gas flow rate: 0.25-1 L/min, flow rate controllable
Xenon lamp power: 3kW 15kW optional
Bar table size: 6.8mm or 9.8mm optional
Tensile rate: 0.1-50mm/h
Adjusting speed: 0.6 mm/s
Stretch size: 130mm, 150mm, 195mm optional
Rotation speed: 0-70rpm
Power consumption: 400V three-phase 63A 50Hz
Host size: 330cm * 163cm * 92cm (slightly different specifications)

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